The project’s objective is the development of theoretical and computational methods for the characterization of micro and nanostructures through the analysis and simulation of electronic and atomic microscopy images. The anostructures to be investigated are either the building blocks of semiconductor industry, used in integrated circuits (nanoelectronics) or derive from other areas of nanotechnology such as smart surfaces, biomaterials, photonics etc. The target of this project is to achieve the mathematical innovation needed to provide the computational tools
for the accurate and complete metrology of the morphological complexity of such nanostructures. The project will focus on and add value to: a) the measurement accuracy, b) the morphological complexity of nanostructures. All of the above will lead to the improvement of Nanometrisis existing metrological software, as well as the development of new codes and algorithms, in order to enrich the software family and widen the company’s commercial target spectrum.